Photo-MOCVD of copper thin films using Cu(ll) and Cu(l) precursors for low-temperature metallization

Advanced Functional Materials

Volumn 10, Issue 3-5, 2000, Pages 123-133

  Maury, F ^a   Vidal, S ^a   Gleizes, A ^a  

^a INSTITUT CARNOT CIRIMAT   (France)

Author keywords

Cu precursors; Cu thin films; Metal organic precursors; Photo activation; Photo MOCVD; UV lamp

Indexed keywords

CHARGE TRANSFER; COPPER; CRYSTAL MICROSTRUCTURE; FILM GROWTH; MERCURY VAPOR LAMPS; METALLIZING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTONS; THERMODYNAMIC STABILITY; ULTRAVIOLET SPECTROSCOPY;

PHOTOMETALLORGANIC CHEMICAL VAPOUR DEPOSITION (MOCVD);

THIN FILMS;

EID: 0034180041     PISSN: 1616301X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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