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Volumn 80, Issue 3, 2000, Pages 555-572

Orientation mediated self-assembled gallium phosphide islands grown on silicon

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BEAM EPITAXY; COALESCENCE; CRYSTAL ORIENTATION; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH TEMPERATURE EFFECTS; INTERFACIAL ENERGY; MORPHOLOGY; NUCLEATION; SILICON; TRANSMISSION ELECTRON MICROSCOPY; TWO DIMENSIONAL;

EID: 0034161029     PISSN: 01418610     EISSN: None     Source Type: Journal    
DOI: 10.1080/01418610008212068     Document Type: Article
Times cited : (36)

References (28)
  • 26
    • 0011742518 scopus 로고
    • A. G. Cullis, A. E. Staton-Bevan and J. L. HutchisonBristol, England; Royal Microscopical Society
    • Vila, A., Cornet, A., Morante, J. R., and Ruterana, P., 1993, Microscopy of Semiconducting Materials 1993, edited by A. G. Cullis, A. E. Staton-Bevan and J. L. Hutchison (Bristol, England; Royal Microscopical Society), pp. 353-356.
    • (1993) Microscopy of Semiconducting Materials , pp. 353-356
    • Vila, A.1    Cornet, A.2    Morante, J.R.3    Ruterana, P.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.