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Volumn 125, Issue 1, 2000, Pages 60-74

Two-dimensional fluid simulation of plasma reactors for the immobilization of krypton

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; GLOW DISCHARGES; KRYPTON; NONLINEAR EQUATIONS; NUCLEAR FUEL REPROCESSING; NUCLEAR REACTORS; POISSON DISTRIBUTION; RADIOACTIVE WASTE VITRIFICATION;

EID: 0034159180     PISSN: 00104655     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0010-4655(99)00462-2     Document Type: Article
Times cited : (10)

References (48)
  • 37
    • 0008505463 scopus 로고
    • Plasma process modeling
    • M. Meyyappan (Ed.) Artech House, Boston, London
    • M. Meyyappan, Plasma process modeling, in: Computational Modeling in Semiconductor Processing, M. Meyyappan (Ed.) (Artech House, Boston, London, 1995) pp. 231-323.
    • (1995) Computational Modeling in Semiconductor Processing , pp. 231-323
    • Meyyappan, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.