Growth characteristics of vacuum coated thick a-Se films for device applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 665-670

  Juhasz, C ^a   Gembala, V ^a   Kasap, S O ^b  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF SASKATCHEWAN   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CONDENSATION; CRYSTAL GROWTH; CRYSTALLIZATION; DEPOSITION; EVAPORATION; FILM GROWTH; MATHEMATICAL MODELS; RATE CONSTANTS; THERMAL EFFECTS; VACUUM APPLICATIONS;

ARRHENIUS RATE; SUBSTRATE TEMPERATURE; VACUUM DEPOSITION; VOGEL-TAMMAN-FULCHER BEHAVIOR;

AMORPHOUS FILMS;

EID: 0034156265     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582245     Document Type: Article

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