Improvement in downflow etching rate using Au as a catalyst

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 388-392

  Kataoka, Yoshinori ^a   Shinmura, Tadashi ^a   Kanoh, Masaaki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; DESORPTION; DISSOCIATION; EMISSION SPECTROSCOPY; GOLD; MASS SPECTROMETRY; PLASMAS; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

DOWNFLOW ETCHING PROCESS; OPTICAL EMISSION SPECTRAL ANALYSIS; POLYCRYSTALLINE SILICON ETCHING RATE; THERMAL DESORPTION SPECTROMETRY;

ETCHING;

EID: 0034156263     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582198     Document Type: Article

References (5)

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