Nanostructured diamond film on etched silicon and its field emission behavior

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 2, 2000, Pages 1048-1050

  Xu, N S ^a   Chen, Jian ^a   Feng, Y T ^a   Deng, S Z ^a  

^a SUN YAT SEN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; DIAMOND FILMS; ELECTRON EMISSION; ELECTRON TUNNELING; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON; SURFACE ROUGHNESS;

CONDUCTION BANDS; ELECTRON AFFINITY; NANOSTRUCTURED DIAMOND FILMS;

FIELD EMISSION CATHODES;

EID: 0034155534     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591325     Document Type: Article

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