Oxidation-induced stacking faults introduced by using a cavitating jet for gettering in silicon

Electrochemical and Solid-State Letters

Volumn 3, Issue 2, 2000, Pages 93-94

  Soyama, H ^a   Kumano, H ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAVITATION; HEAT TREATMENT; IMPURITIES; JETS; NOZZLES; OPTICAL MICROSCOPY; OXIDATION; PRESSURE EFFECTS; STACKING FAULTS; SURFACE TREATMENT; WATER;

CAVITATING JET; GETTERING; INJECTION PRESSURE;

SILICON WAFERS;

EID: 0034140976     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390968     Document Type: Article

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