Effect of H2 addition on SiCN film growth in an electron cyclotron resonance plasma chemical vapor deposition reactor

Journal of Materials Chemistry

Volumn 10, Issue 3, 2000, Pages 783-787

  Wu, Jih Jen ^a   Chen, Kuei Hsien ^a   Wen, Cheng Yen ^b   Chen, Li Chyong ^b   Wang, Juen Kai ^b   Yu, Yueh Chung ^c   Wang, Chang Wan ^c   Lin, Erh Kang ^c  

^a INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c INSTITUTE OF PHYSICS   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; HYDROGEN;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL REACTION; CYCLOTRON; FILM; REACTION ANALYSIS;

EID: 0034120285     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/a908523h     Document Type: Article

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