Energy deposition calculations in dose measurements of 0.2-3.0 MeV electrons

Radiation Physics and Chemistry

Volumn 57, Issue 3-6, 2000, Pages 671-674

  Zhou, Y ^a   An, Z ^a   Hou, Q ^a   Tang, Q ^a  

^a SICHUAN UNIVERSITY   (China)

Author keywords

Bipartition model; Dose measurement; Electron transport; Energy deposition

Indexed keywords

CURING; ELECTRON BEAMS; ELECTRON ENERGY LEVELS; ELECTRON TRANSPORT PROPERTIES; MATHEMATICAL MODELS;

BIPARTITION MODEL; ENERGY DEPOSITION; FILM MATERIAL RADIATION PROCESSING; LOW ENERGY ELECTRON BEAM RADIATION CURING;

DOSIMETRY;

CALCULATION; CONFERENCE PAPER; ELECTRON BEAM; ELECTRON TRANSPORT; ENERGY; MEASUREMENT; MODEL; RADIATION DOSE DISTRIBUTION;

EID: 0034106651     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0969-806X(99)00432-6     Document Type: Conference Paper

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