Determination of boron in uniformly-doped silicon thin films by isotope dilution inductively coupled plasma mass spectrometry

Analyst

Volumn 125, Issue 3, 2000, Pages 493-497

  Park, Chang J ^a   Kim, Kyoung J ^a   Cha, Myoung J ^b   Lee, Dong S ^b  

^a Korea Research Institute of Standards and Science   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; ISOTOPE; SILICON;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL PROCEDURES; CONCENTRATION (PARAMETERS); MASS SPECTROMETRY;

EID: 0034078150     PISSN: 00032654     EISSN: None     Source Type: Journal    
DOI: 10.1039/a909215c     Document Type: Article

References (12)

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