Kinetic model for diamond nucleation upon chemical vapor deposition

Diamond and Related Materials

Volumn 9, Issue 2, 2000, Pages 156-161

  Yang, G W ^a,b   Liu, B X ^b  

^a XIANGTAN UNIVERSITY   (China)

^b TSINGHUA UNIVERSITY   (China)

Author keywords

Chemical vapor deposition; Diamond films; Modeling; Nucleation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; CRYSTAL GROWTH; ETCHING; FILM GROWTH; MATHEMATICAL MODELS; NUCLEATION; REACTION KINETICS; SILICON;

KINETIC MODEL;

DIAMOND FILMS;

CHEMICAL; DIAMOND; DIAMOND COATING; KINETICS; MODELING; VAPOR DEPOSITION;

EID: 0034070609     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00187-4     Document Type: Article

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