Microstructure and oxidation kinetics of intermetallic TiAl after Si- and Mo- ion implantation

Surface and Coatings Technology

Volumn 128-129, Issue , 2000, Pages 418-422

  Hornauer, U ^a   Richter, E ^a   Matz, W ^a   Reuther, H ^a   Mucklich A ^a   Wieser, E ^a   Moller W ^a   Schumacher, G ^b   Schutze M ^b  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b Karl Winnacker Institut   (Germany)

Author keywords

Implantation; Molybdenum; Oxidation; Silicon; TiAl

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DIFFUSION IN SOLIDS; INTERMETALLICS; ION IMPLANTATION; METALLOGRAPHIC MICROSTRUCTURE; MOLYBDENUM; OXIDATION RESISTANCE; REACTION KINETICS; SILICON; THERMOGRAVIMETRIC ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

TITANIUM ALUMINIDE;

TITANIUM ALLOYS;

INTERMETALLIC ALLOY; ION IMPLANTATION; KINETICS; MICROSTRUCTURE; OXIDATION;

EID: 0033941419     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00644-7     Document Type: Conference Paper

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