Polarization-dependent Raman spectroscopic protocols for calibration of the alloy composition and strain in bulk and thin-film Si1-xGex

Semiconductor Science and Technology

Volumn 15, Issue 2, 2000, Pages

  Rath, S ^a,b   Grigorescu, C ^a   Hsieh, M L ^a   Voudouris, E ^a   Stradling, R A ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b NATIONAL INSTITUTE FOR OPTOELECTRONICS   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT POLARIZATION; PHONONS; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; STRAIN;

POLARIZATION-DEPENDENT RAMAN SPECTROSCOPIC PROTOCOLS;

SEMICONDUCTING FILMS;

EID: 0033908173     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/15/2/101     Document Type: Article

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