Microstructural characterisation of metal ion implanted silicon nitride

Surface and Coatings Technology

Volumn 123, Issue 2-3, 2000, Pages 159-163

  Ji, Huaxia ^a   Evans, Peter J ^b   Samandi, Masoud ^a  

^a UNIVERSITY OF WOLLONGONG   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

Amorphous layer; Metal ion implantation; Microstructure; Silicon nitride

Indexed keywords

ION IMPLANTATION; MICROSTRUCTURE; TRIBOLOGY; WEAR;

AMORPHOUS MATERIALS; GROWTH (MATERIALS); ION IMPLANTATION; ION SOURCES; MICROSTRUCTURE; PRECIPITATION (CHEMICAL); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (XTEM); NANO-BEAM ELECTRON DIFFRACTION (NBED) ANALYSIS;

CERAMIC COATINGS;

EID: 0033906262     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00516-2     Document Type: Article

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