Comparison of the optical properties and UV radiation resistance of HfO2 single layers deposited by reactive evaporation, IAD, and PIAD

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3902, Issue , 2000, Pages 182-193

  Thielsch, Roland ^a   Feigl, Torsten ^a   Kaiser, Norbert ^a   Martin, Sven ^a   Scaglione, Salvatore ^a   Sarto, Francesca ^a   Alvisi, Marco ^a   Rizzo, Antonella ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EVAPORATION; FUSED SILICA; HAFNIUM COMPOUNDS; LASER DAMAGE; LIGHT ABSORPTION; LIGHT INTERFERENCE; OPTICAL COATINGS; SPUTTER DEPOSITION; THIN FILMS; ULTRAVIOLET RADIATION;

ION ASSISTED DEPOSITION (IAD); LASER-INDUCED DAMAGE THRESHOLD (LIDT); PLASMA ION ASSISTED DEPOSITION (PIAD); REACTIVE BEAM EVAPORATION (RE);

OPTICAL FILMS;

EID: 0033906097     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.379310     Document Type: Conference Paper

References (20)