Reduction of absorption loss in silica-on-silicon channel waveguides fabricated by low temperature PECVD process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4016, Issue , 2000, Pages 81-85

  Sahu, Jayanta K ^a   Wosinski, Lech ^a   Fernando, Harendra ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

INSERTION LOSSES; LIGHT ABSORPTION; LIGHT INTERFERENCE; LIGHT PROPAGATION; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; WAVEGUIDE COUPLERS;

MULTIMODE INTERFERENCE (MMI); SILICA-ON-SILICON CHANNEL WAVEGUIDES;

OPTICAL WAVEGUIDES;

EID: 0033903275     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)