RF frequency effects on molecular fragmentation

Plasma Sources Science and Technology

Volumn 9, Issue 1, 2000, Pages 37-44

  Manolache, S ^a   Sarfaty, M ^b   Denes, F ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; ELECTRIC DISCHARGES; ELECTRODES; MOLECULAR STRUCTURE; MORPHOLOGY; SILANES; STAINLESS STEEL; SURFACE CHEMISTRY; SURFACE STRUCTURE;

DICHLOROSILANES; MOLECULAR FRAGMENTATION; SILICON TETRACHLORIDE;

PLASMA SOURCES;

EID: 0033903263     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/1/307     Document Type: Article

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