Lamb-wave microdevices fabricated on monolithic single crystal silicon wafers

Journal of Microelectromechanical Systems

Volumn 9, Issue 1, 2000, Pages 88-93

  Fischer, Daniel ^a   Varhue, Walter J ^a   Wu, Junru ^a   Whiting, Charles A ^b  

^a UNIVERSITY OF VERMONT   (United States)

^b IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; MEMBRANES; PHOTOACOUSTIC EFFECT; PIEZOELECTRIC MATERIALS; SILICON WAFERS; SINGLE CRYSTALS; STRESSES; SURFACES; THIN FILMS; ZINC OXIDE;

ETHANOLAMINE ETCHANT; LAMB WAVE MICRODEVICES; PHOTOACOUSTIC TESTING; PIEZOELECTRIC FILM; SINGLE CRYSTAL SILICON MEMBRANE; THIN FILM STRESS;

ULTRASONIC DEVICES;

EID: 0033901771     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.825782     Document Type: Article

References (8)

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