Thermal stability of Co/Hf and Co/Ti bilayers on SiO2

Materials Chemistry and Physics

Volumn 62, Issue 1, 2000, Pages 29-34

  Kwon, Youngjae ^a   Lee, Chongmu ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ANNEALING; COBALT COMPOUNDS; EPITAXIAL GROWTH; SUBSTRATES;

SELF-ALIGNED SILICIDE;

SILICA;

EID: 0033900768     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(99)00156-X     Document Type: Article

References (13)

1. S. Wolf, Silicon Processing for VLSI Era, Process Integration, vol. 2, Lattice Press, CA, 1990, pp. 84-175.
2. S.P. Muraka, D.S. Williams, J. Vac. Sci. Technol. B5, 1674, 1987.
3. Morgan A.E., Broadbent E.K., Delfino M., Coulman B., Sadana D.K. J. Elcectrochem. Soc. 134:1987;925.
4. Lawrence M., Dass A., Fraser D.B., Wei C.S. Appl. Phys. Lett. 58:1991;1308.
5. Vantomme A., Nicolet M.-A., Theodore N.D. J. Appl. Phys. 75:1994;3882.
6. J.S. Byun, Ph.D. Thesis, Seoul Natl. University, 1992.
7. Byun J.S., Kim J.J., Kim W.S., Kim H.J. J. Elcectrochem. Soc. 142(8):1995;2805.
8. Y. Kwon, C. Lee, H.K. Kang, D.L Bae, Mat. Chem. Phys., submitted.
9. Morgan A.E., Broadbent E.K., Ritz K.N., Sadana D.K., Burrow B.J. J. Appl. Phys. 64:1988;344.
10. Ting C.Y., Wittmer M., Iyer S.S., Brodsky S.B. J. Electrochem. Soc. 131:1984;2934.
11. Krooshof G.J.P., Habraken F.H.P.M., van der Weg W.F., Van den hove L., Maex K., De Keersmaecker R.F. J. Appl. Phys. 63:1988;5110.
12. Kim Y.N., Kang S.C., Park J.S., Lee N.I., Kim I.K., Kim Y.W. J. Kor. Vac. Soc. 2(1):1993;28.
13. Sun K.H. J. Am. Ceram. Soc. 30:1949;277.