Effect of energy on direct ion beam deposition of carbon thin films: Induced defects and graphitization

Surface and Coatings Technology

Volumn 125, Issue 1-3, 2000, Pages 57-60

  Durand, H A ^a   Sekine, K ^a   Etoh, K ^a   Ito, K ^a   Kataoka, I ^a  

^a Japan Aviat Electron Indust   (Japan)

Author keywords

Carbon; Fractal surface; Ion beams; Nickel; Scanning tunneling microscope; Thin films

Indexed keywords

CARBON; DEFECTS; DEPOSITION; FRACTALS; GRAPHITIZATION; ION BEAMS; ION IMPLANTATION; NICKEL; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS;

ION BEAM DEPOSITION;

AMORPHOUS FILMS;

EID: 0033899711     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00547-2     Document Type: Article

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