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Volumn 22, Issue 4, 2000, Pages 51-52,-54

Peroxide control in Cu/W CMP slurry

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMATION; CHEMICAL POLISHING; COPPER; DEGRADATION; ERRORS; HYDROGEN PEROXIDE; PROCESS CONTROL; PROGRAMMABLE LOGIC CONTROLLERS; REGRESSION ANALYSIS; SLURRIES; STABILIZERS (AGENTS); TUNGSTEN;

EID: 0033898176     PISSN: 02656027     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)

References (0)
  • Reference 정보가 존재하지 않습니다.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.