Deposition of nano-size titania-silica particles in a hot-wall CVD process

Journal of the American Ceramic Society

Volumn 83, Issue 4, 2000, Pages 709-712

  Lu, Shih Yuan ^a   Chen, Shan Wei ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AGGLOMERATION; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; SILICA; THERMAL EFFECTS; TITANIUM DIOXIDE;

TETRAETHYLORTHOSILICATE; TITANIUM TETRAISOTROPOXIDE;

CERAMIC MATERIALS;

EID: 0033898167     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2000.tb01263.x     Document Type: Article

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