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Volumn 359, Issue 2, 2000, Pages 255-260

Material characterization of Cu(Ti)-polyimide thin film stacks

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPOUNDS; DEPOSITION; POLYIMIDES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0033896650     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00872-X     Document Type: Article
Times cited : (26)

References (19)
  • 1
    • 0037624969 scopus 로고
    • H.J.A.D. Gupta. Pittsburgh, PA: The Minerals, Metals and Materials Society
    • Gupta D., Faupel F., Willecke R. Gupta H.J.A.D. Diffusion in Amorphous Materials. 1993;189 The Minerals, Metals and Materials Society, Pittsburgh, PA.
    • (1993) Diffusion in Amorphous Materials , pp. 189
    • Gupta, D.1    Faupel, F.2    Willecke, R.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.