Selectivity and sensitivity studies on plasma treated thick film tin oxide gas sensors

Microelectronics Journal

Volumn 31, Issue 4, 2000, Pages 283-290

  Chaturvedi, A ^a   Mishra, V N ^a   Dwivedi, R ^a   Srivastava, S K ^a  

^a Ctr for Res in Microelectronics   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; HYDROGEN; IONIC CONDUCTION; MATHEMATICAL MODELS; NITROGEN; OXYGEN; PLASMAS; SEMICONDUCTING TIN COMPOUNDS; SENSITIVITY ANALYSIS; STOICHIOMETRY; THICK FILM DEVICES; X RAY DIFFRACTION ANALYSIS;

PLASMA TREATMENT;

CHEMICAL SENSORS;

EID: 0033896183     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(99)00147-0     Document Type: Article

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