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Volumn 161-163, Issue , 2000, Pages 682-685

Nuclear reaction analysis of hydrogen migration in silicon dioxide films on silicon under15N ion irradiation

Author keywords

Hydrogen; Radiation enhanced diffusion; RNRA; SiO2 Si

Indexed keywords

CHEMICAL ANALYSIS; DIFFUSION IN SOLIDS; ION BEAMS; ION BOMBARDMENT; NITROGEN; SILICA; SILICON; THIN FILMS;

EID: 0033893707     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00830-7     Document Type: Article
Times cited : (10)

References (12)
  • 1
    • 0000703674 scopus 로고
    • Extended Abs., Electronics Div.
    • P. Balk, Extended Abs., Electronics Div.; Electrochem. Soc. 14 (1965) 237.
    • (1965) Electrochem. Soc. , vol.14 , pp. 237
    • Balk, P.1
  • 4
    • 33645838346 scopus 로고    scopus 로고
    • M.A. Briere, Berichte des Hahn-Meitner- Institutes HMI-B 509 (1993)
    • M.A. Briere, Berichte des Hahn-Meitner- Institutes HMI-B 509 (1993).
  • 12
    • 33645821018 scopus 로고    scopus 로고
    • J. Krauser, Berichte des Hahn-Meitner-Institutes HMI-B 535 (1996)
    • J. Krauser, Berichte des Hahn-Meitner-Institutes HMI-B 535 (1996).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.