Transition metal (thin-film)/Si (substrate) contacts: buried interface study by soft X-ray emission spectroscopy

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 72, Issue 2, 2000, Pages 156-159

  Wang, Jinliang ^a   Wang, Tianmin ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON ENERGY LEVELS; ELECTRON IRRADIATION; HEAT TREATMENT; INTERFACES (MATERIALS); MANGANESE; NONDESTRUCTIVE EXAMINATION; SILICON; SPECTRUM ANALYSIS;

BURIED INTERFACE; EMISSION BAND SPECTRA; NONDESTRUCTIVE DEPTH PROFILING; SOFT X RAY EMISSION SPECTROSCOPY;

X RAY SPECTROSCOPY;

EID: 0033893689     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00497-3     Document Type: Article

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