Ion beam analysis of copper selenide thin films prepared by chemical bath deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 161, Issue , 2000, Pages 635-640

  Andrade, E ^a   Garcia, V M ^b   Nair, P K ^c   Nair, M T S ^c   Zavala, E P ^a   Huerta, L ^a   Rocha, M F ^d  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^b Facultad de Ciencias Químicas   (Guadeloupe)

^c INSTITUTO DE ENERGÍAS RENOVABLES   (Mexico)

^d INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL ANALYSIS; COMPOSITION; COPPER COMPOUNDS; DEPOSITION; ELECTRIC PROPERTIES; GLASS; ION BEAMS; OPTICAL PROPERTIES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION;

CHEMICAL BATH DEPOSITION; COPPER SELENIDE; ION BEAM ANALYSIS;

THIN FILMS;

EID: 0033889527     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00994-5     Document Type: Article

References (8)

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