High purity metal production using dry refining processes

Materials Transactions, JIM

Volumn 41, Issue 1, 2000, Pages 37-43

  Kim, Poong ^a   Mihara, Yasuo ^a   Ozawa, Eiichi ^a   Nozawa, Yoshiharu ^b   Hayashi, Chikara ^a  

^a Vacuum Metallurgical Co Ltd   (Japan)

^b ULVAC Materials Technology Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER; EVAPORATION; HYDROGEN; MASS SPECTROMETRY; METAL REFINING; OXYGEN; PHASE COMPOSITION; PURIFICATION; THIN FILMS; TUNGSTEN;

CHARGED PARTICLE ACTIVATION ANALYSIS; GAS DEPOSITION; GLOW DISCHARGE MASS SPECTROMETRY; LASER PHYSICAL VAPOR DEPOSITION; NITROGEN CARRIER GAS EXTRACTION METHOD;

ALUMINUM;

EID: 0033884663     PISSN: 09161821     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans1989.41.37     Document Type: Article

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