Synthesis and characterization of low-dielectric silica aerogel films

Journal of the American Ceramic Society

Volumn 83, Issue 3, 2000, Pages 533-540

  Hyun, Sang H ^a   Kim, Joong J ^a   Park, Hyung H ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AGING OF MATERIALS; DENSITY (SPECIFIC GRAVITY); DIELECTRIC MATERIALS; DRYING; MICROSTRUCTURE; PERMITTIVITY; POROSITY; SILICA GEL; SILICON WAFERS; SYNTHESIS (CHEMICAL); THIN FILMS; VISCOELASTICITY;

SILICA AEROGELS; SUPERCRITICAL DRYING;

AEROGELS;

EID: 0033882321     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2000.tb01230.x     Document Type: Article

References (16)

1. P. Singer, "New Interconnect Materials: Chasing the Promise of Faster Chips," Semicond. Int., 17 [13] 52-56 (1994).
2. L. W. Hurbesh and J. F. Poco, "Thin Aerogel Films for Optical, Thermal, Acoustic and Electronic Applications," J. Non-Cryst. Solids, 188, 46-53 (1995).
3. L. W. Hurbesh, L. E. Keene, and V. R. Latorre, "Dielectric Properties of Aerogels," J. Mater, Res., 8 [7] 1736-41 (1993).
4. C. H. Ting and T. E. Seida J, "Methods and Needs for Low k Material Research," Mater. Res. Soc. Symp. Proc., 381, 3-17 (1995).
5. Y. K. Lee, S. P. Muraka, S. P. Jeng, and B. Auman, "Investigations of the Low Dielectric Constant Fluorinated Polyimide for Use as the Interlayer Dielectric in ULSI," Mater. Res. Soc. Symp. Proc., 381, 31-43 (1995).
6. F. S. Ip and C. Ting, "Dielectric Properties of Low Dielectric Constant Polymeric Materials." Mater. Res. Soc. Symp. Proc., 381, 135-39 (1995).
7. C. F. Yeh, S. S. Lin, and W. Lur, "Characterization of Dielectric Constant for Liquid Phase Deposited (LPD) SiO2-JtF, Films"; pp. 101-103 in Proceedings of the 13th International VMIS (Santa Clara, CA, June 1996). (Papers compiled by Dr. T. E. Wade, University of South Florida, Tampa, FL.)
8. J. Fricke and A. Emmcrling, "Aerogels," J. Am. Ceram. Soc., 75 [8] 2027-36 (1992).
9. S. S. Prakash, C. J. Drinker, A. J. Hurd, and S. M. Rao, "Silica Aerogel Films Prepared at Ambient Pressure by Using Surface Derivatization to Induce Reversible Drying Shrinkage," Nature (London), 374 [30] 439-43 (1995).
10. D.-J. Kim and S.-II. Hyun, "Low Pressure Synthesis of Silica Aerogels by Supercritical Drying," J. Korean Ceram. Soc., 33 [5] 485-94 (1996).
11. S.-H. Hyun, C.-H. Lee, and D.-J. Kim, "Surface Modification of Silica Aerogels," J. Korean Ceram. Soc., 33 [12] 1319-24 (1996).
12. J. Phalippou, T. Woignier, and M. Prassas, "The Synthesis of Monolithic Silica Aerogel," J. Mater. Sci., 25, 3111-17 (1990).
13. G. W. Scherer, S. Hreid, E. Nilsen, and M.-A. Einarsrud, "Shrinkage of Silica Gels Aged in TEOS," J. Non-Cryst. Solids, 202, 42-52 (1996).
14. S. Haereid, E. Nilsen, and M.-A. Einarsrud, "Properties of Silica Gels Aged in TEOS," J. Non-Cryst. Solids, 204, 228-34 (1996).
15. F. Ban-David and B. F. Dodge, "Vapor-Liquid Equilibrium at High Pressures," J. Chem. Eng. Data, 4 [2] 107-21 (1959).
16. L. Kocon, F. Despetis, and J. Phalippou, "Ultralow Density Silica Aerogels by Alcohol Supercritical Drying," J. Non-Cryst. Solids, 225, 96-100 (1998). Ü