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Volumn 9, Issue 1, 2000, Pages
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Impact of resist on the mask error enhancement factor
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
IMAGE ANALYSIS;
IMAGE QUALITY;
MASKS;
NONLINEAR OPTICS;
SEMICONDUCTOR DEVICE MODELS;
SENSITIVITY ANALYSIS;
MASK ERROR ENHANCEMENT FACTOR (MEEF);
PHOTORESISTS;
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EID: 0033882120
PISSN: 1074407X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
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Times cited : (4)
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References (1)
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