Microstructure and hardness of silicon carbide synthesized by plasma pressure compaction

Journal of Alloys and Compounds

Volumn 299, Issue 1-2, 2000, Pages 292-296

  Ravi, B G ^a   Omotoye, O A ^a   Srivatsan, T S ^a   Petrorali, M ^b   Sudarshan, T S ^c  

^a The University of Akron   (United States)

^b TIMKEN COMPANY   (United States)

^c MATERIALS MODIFICATION INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GRAIN BOUNDARIES; HARDNESS; MICROSTRUCTURE; PLASMA APPLICATIONS; POWDER METALLURGY; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); THERMAL EFFECTS;

PLASMA PRESSURE COMPACTION;

SILICON CARBIDE;

EID: 0033881923     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(99)00815-4     Document Type: Article

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