Simultaneous nuclear reaction analyses of boron and phosphorus in thin borophosphosilicate glass films using (α, p) reactions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 161, Issue , 2000, Pages 629-634

  Walsh, D S ^a   Doyle, B L ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL ANALYSIS; CHEMICAL REACTIONS; DIELECTRIC MATERIALS; ELLIPSOMETRY; GLASS; INTEGRATED CIRCUITS; ION BEAMS; MASS SPECTROMETRY; PHOSPHORUS; THICKNESS MEASUREMENT;

BOROPHOSPHOSILICATE GLASS; NUCLEAR REACTION ANALYSIS;

THIN FILMS;

EID: 0033879211     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00981-7     Document Type: Article

References (11)

1. S.M. Sze, Semiconductor Devices Physics and Technology, Wiley, New York, 1985.
2. K. Nassau, R.A. Levy, D.L. Chadwick, J. Electrochem. Soc. 132 (2) (1985) 409.
3. K.J. Uram, J.K. Shugrue , N.P. Sandler, in: V.J. Kapoor, W.D. Brown (Ed.), Proceedings of the Third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, Dielectric Science and Technology and Electronics Divisions Proceedings, vol. 94-16, The Electrochemical Society, 1994.
4. G.D. Mea, Nucl. Instr. and Meth. B 15 (1986) 495.
5. L.C. McIntyre Jr., J.A. Leavitt, B. Dezfouly-Arjomandy, J. Oder, Nucl. Instr. and Meth. B 35 (1988) 446.
6. E. Ligeon, M. Bruel, A. Bontemps, G. Chambert, J. Monnier, J. Radioanal. Chem. 16 (1973) 537.
7. N. Moncoffre, Nucl. Instr. and Meth. B 66 (1992) 126.
8. A.E. Pillay, M. Peisach, Nucl. Instr. and Meth. B 66 (1992) 226.
9. L.C. McIntyre Jr., J.A. Leavitt, M.D. Ashbaugh, A. Lin, J.O. Stoner Jr., Nucl. Instr. and Meth. B 66 (1992) 221.
10. D.S. Walsh, B.L. Doyle, W.R. Wampler, A.K. Hays, J. Vac. Sci. Technol. A 9 (1991) 727.
11. B.L. Doyle, D.S. Walsh, W.R. Wampler, J. Nucl. Mater. 196-198 (1992) 658.