Photoluminescence properties of C60 films deposited on silicon substrate

Journal of Luminescence

Volumn 86, Issue 2, 2000, Pages 129-135

  Capozzi, V ^a   Celentano, G ^a   Perna, G ^a   Lorusso, G F ^a   Minafra, A ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EXCITONS; FULLERENES; PHONONS; PHOTOLUMINESCENCE; SILICON; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

SELF-TRAPPED EXCITONS;

OPTICAL FILMS;

EID: 0033879057     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-2313(99)00202-1     Document Type: Article

References (24)

1. Leach S., Vervloet M., Deprès A., Bréheret E., Hare J.P., Dennis T.J., Kroto H.W., Taylor R., Walton D.R.M. Chem. Phys. 160:1992;451.
2. Wang Y. J. Phys. Chem. 96:1992;764.
3. Wang Y., Holden J.M., Rao A.M., Eklund P.C., Venkateswaran U.D., Eastwood DeLyle, Lidberg R.L., Dresselhaus G., Dresselhaus M.S. Phys. Rev. B. 51:1995;4547.
4. Matus M., Kuzmany H., Sohmen E. Phys. Rev. Lett. 68:1992;2822.
5. Pichler K., Graham S., Gelsen O.M., Friend R.H., Romanow W.J., McCauley J.P., Coustel N., Fisher J.E., Smith A.B. J. Phys. Condens. Matter 3:1991;9259.
6. Ebbesen T.W., Mochizuki Y., Tanigaki K., Hiura H. Europhys. Lett. 25:1994;503.
7. Sauvajol J.L., Hricha Z., Coustel N., Zahab A., Aznar R. J. Phys. Condens. Matter 5:1993;2045.
8. Byrne H.J., Maser W.K., Rühle W.W., Mittelbach A., Honle W., von Schnering H.G., Roth S. Synth. Met. 54:1993;265.
9. Feldmann J., Guss W., Lemmer U., Göbel E.O., Taliani C., Mohn H., Müller W., Häussler P., ter Meer H.-U. Mol. Cryst. Liq. Cryst. 256:1994;757.
10. Guss W., Feldmann J., Göbel E.O., Taliani C., Mohn H., Müller W., Häussler P., ter Meer H.-U. Phys. Rev. Lett. 72:1994;2644.
11. van den Heuvel D.J., Chan I.Y., Groenen E.J.J., Matsushita M., Schmidt J., Mejier G. Chem. Phys. Lett. 233:1995;284.
12. Schlaich H., Muccini M., Feldmann J., Bässler H., Göbel E.O., Zamboni R., Taliani C., Erxmeyer J., Weidinger A. Chem. Phys. Lett. 236:1995;135.
13. Negri F., Orlandi G., Zerbetto F. J. Chem. Phys. 97:1992;6496.
14. Capozzi V., Santoro M., Celentano G., Berger H., Lorusso G.F. J. Lumin. 76 and 77:1998;395.
15. H.P. Klug, L.E. Alexander, X-Ray Diffraction Procedure, Wiley, New York, 1974, p. 491 (Chapter IX).
16. Capozzi V., Trovato T., Berger H., Lorusso G.F. Carbon. 35:1997;763.
17. Ichida M., Sakai M., Yajima T., Nakamura A. Progr. Cryst. Growth Charact. Mater. 33:1996;125.
18. Akimoto I., Azuma J., Ashida M., Kan'no K. J. Lumin. 76 and 77:1998;206.
19. Van Loosdrecht P.H.M., van Bentum P.J.M., Verheijen M.A., Meijer G. Chem. Phys. Lett. 198:1992;587.
20. Bethune D.S., Meijer G., Tang W.C., Rosen H.J. Chem. Phys. Lett. 174:1990;219.
21. Schmidt T., Lischka K., Zulehner W. Phys. Rev. B. 45:1992;8989.
22. Krustok J., Collan H., Hyet K. J. Appl. Phys. 8:1997;1442.
23. Venkateswaran U.D., Schall M.G., Wang Y., Zhou P., Eklund P.C. Solid State Commun. 96:1995;951.
24. Averitt R.D., Pippenger P.M., Papanyan V.O., Dura J.A., Nordlander P., Halas N.J. Chem. Phys. Lett. 242:1995;592.