Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3902, Issue , 2000, Pages 242-249

  Blaschke, H ^a   Arens, W ^a   Ristau, D ^a   Martin, S ^a   Li, B C ^a   Welsch, E ^a  

^a LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; FLUORINE COMPOUNDS; LASER DAMAGE; LIGHT ABSORPTION; NONLINEAR OPTICS; OPTICAL COATINGS; OPTICAL INSTRUMENT LENSES; SPUTTER DEPOSITION; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET (DUV) COATINGS; ION BEAM SPUTTERING (IBS); LASER INDUCED DAMAGE THRESHOLD (LIDT); NONLINEAR ABSORPTION;

MIRRORS;

EID: 0033878130     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.379306     Document Type: Conference Paper

References (10)