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Volumn 78, Issue 1, 2000, Pages 35-40

AC-electrochemical cleaning of aluminium

Author keywords

Ac cleaning; Ac potential response; Cleaning mechanism; Cleaning rate; Oxide thickness

Indexed keywords

ANODIC OXIDATION; CHEMICAL CLEANING; ELECTROCHEMISTRY; METAL CLEANING; OXIDES; PHOSPHORIC ACID; SCANNING ELECTRON MICROSCOPY; SULFURIC ACID; SURFACE ROUGHNESS;

EID: 0033876529     PISSN: 00202967     EISSN: None     Source Type: Journal    
DOI: 10.1080/00202967.2000.11871301     Document Type: Article
Times cited : (3)

References (19)
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    • Sacchi, F.1
  • 16
    • 33749122994 scopus 로고    scopus 로고
    • 3rd Asian-Pacific Corrosion Control Conference Materials Conservation and Corrosion Control 1983, 615.
    • G.G. Tu, GE.Thompson, G.C. Wood, Proc. 3rd Asian-Pacific Corrosion Control Conference Materials Conservation and Corrosion Control 1983, 615.
    • GE.Thompson, G.C. Wood, Proc.
    • Tu, G.G.1
  • 18
    • 33749137373 scopus 로고    scopus 로고
    • 26, edited by C.H. Bamford, R.G. Compton, Elsevier Science Publishers, Amsterdam, 1986.
    • Comprehensive Chemical Kinetics. Principles and Methodology'', Vol. 26, edited by C.H. Bamford, R.G. Compton, Elsevier Science Publishers, Amsterdam, 1986.
    • Kinetics. Principles and Methodology'', Vol.
    • Chemical, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.