Threshold effect of incident light intensity for the resistance against the photorefractive light-induced scattering in doped lithium niobate crystals

Optics Communications

Volumn 176, Issue 1, 2000, Pages 91-96

  Kamber, Nouel Y ^a   Xu, Jingjun ^a   Mikha, Sonia M ^a   Zhang, Guoquan ^a   Liu, Simin ^a   Zhang, Guangyin ^a  

^a NANKAI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

HOLOGRAPHY; IMAGE RECONSTRUCTION; IRON; LIGHT SCATTERING; LITHIUM NIOBATE; OPTICAL IMAGE STORAGE; OPTICAL VARIABLES CONTROL; SIGNAL TO NOISE RATIO; SPURIOUS SIGNAL NOISE;

DOUBLE DOPED LITHIUM NIOBATE CRYSTALS; FANNING NOISE; PHOTOREFRACTIVE LIGHT INDUCED SCATTERING; PHOTOREFRACTIVE STORAGE;

PHOTOREFRACTIVE MATERIALS;

EID: 0033875597     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(00)00523-X     Document Type: Article

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