Low energy ion beam assisted deposition of biaxially aligned YSZ and CeO2/YSZ films on r-plane sapphire

Surface and Coatings Technology

Volumn 124, Issue 1, 2000, Pages 61-65

  Mu, Haicuan ^a   Ren, Congxin ^a   Jiang, Binyao ^a   Yu, Yuehui ^a   Luo, E Z ^b   Wilson, Z H ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Biaxially aligned; Ion beam assisted deposition; R plane sapphire substrate; YSZ and CeO2 YSZ thin films

Indexed keywords

CERIUM COMPOUNDS; COMPUTER SIMULATION; DEPOSITION; ION BEAMS; ION BOMBARDMENT; MONTE CARLO METHODS; MULTILAYERS; SAPPHIRE; SURFACE ROUGHNESS; TEXTURES; THIN FILMS; ZIRCONIA;

ION BEAM ASSISTED DEPOSITION (IBAD); YTTRIA-STABILIZED ZIRCONIA (YSZ);

SUPERCONDUCTING FILMS;

EID: 0033875352     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00622-2     Document Type: Article

References (17)

1. Foltyn S.R., Muenchauseu R.E., Dye R.C., Wu X.D., Luo L., Cooke D.W., Taber R.C. Appl. Phys. Lett. 59:1991;1374.
2. Greer J.A., Tabat M.D. J. Vac. Sci. Technol. A. 13:1995;1175.
3. Newman N., Cole B.F., Garrison S.M., Char K., Taber R.C. IEEE Trans. Magn. 27:1991;1276.
4. Naito M., Hammond R.H., Oh B., Hahu M.R., Hsu J.W.P., Roseuthal P., Marshall A.F., Beasley M.R., Geballe T.H., Kapitulnik A. J. Mater. Res. 2:1987;713.
5. Garrison S.M., Newman N., Cole B.F., Char K., Barton R.W. Appl. Phys. Lett. 58:1991;2168.
6. Laderman S.S., Taber R.C., Jacowitz R.D., Moll J.L., Eom C.B., Hylton T.L., Marshall A.F., Geballe T.H., Beasley M.R. Phys. Rev. B. 43:1991;2922.
7. Char K., Newman N., Garrison S.M., Barton R.W., Taber R.C., Laderman S.S., Jacowitz R.D. Appl. Phys. Lett. 57:1990;409.
8. Moeckly B.H., Lathrop K.K., Russek S.E., Buhrman A.A., Norton M.G., Carter C.B. IEEE Trans. Magn. 27:1991;1017.
9. Wu X.D., Dye R.C., Muenchausen R.E., Foltyn S.R., Maley M., Rollett A.D., Garcia A.R., Nogar N.S. Appl. Phys. Lett. 58:1991;2165.
10. Fonk D.K., Fenner D.B., Barton R.W., Phillips J.M., Connell G.A.N., Boyce J.B., Geballe T. Appl. Phys. Lett. 57:1990;1161.
11. Dobrev D. Thin Solid Films. 92:1982;41.
12. Yu L.S., Harper J.M.E., Cumo J.J., Smith D.A. J. Vac. Sci. Technol. A. 4:1986;443.
13. Audoh Y., Ogata K., Yamaki H., Sakai S. Nucl. Instrum. Meth. Phys. Res. B. 39:1989;58.
14. Vanwyk G.N., Smith H.J. Nucl. Instrum. Meth. 170:1980;433.
15. Bradley R.M., Harper J.M.E., Smith D.A. J. Appl. Phys. 60:1986;4160.
16. Iijima Y., Onabe K., Tanabe N., Sadakata N., Kohno O., Ikeuo Y. J. Appl. Phys. 74:1993;1905.
17. Reade R.P., Berdahl P., Russo R.E. Appl. Phys. Lett. 61:(18):1992;2.