Ion beam analysis of nanoporous surfaces produced by He-implantation and oxidised by plasma-immersion ion-implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 161, Issue , 2000, Pages 1048-1053

  Markwitz, A ^a   Johnson, P B ^b   Gilberd, P W ^b   Collins, G A ^c   Cohen, D D ^c   Dytlewski, N ^c  

^a GNS SCIENCE   (New Zealand)

^b VICTORIA UNIVERSITY OF WELLINGTON   (New Zealand)

^c AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; DOSIMETRY; HELIUM; NANOSTRUCTURED MATERIALS; OXYGEN; PARTICLE ACCELERATORS; POROUS MATERIALS; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TITANIUM; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ION ACCELERATORS; ION BEAM ANALYSIS; PLASMA IMMERSION;

ION IMPLANTATION;

EID: 0033871996     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00679-5     Document Type: Article

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