Development of embedded attenuated phase-shifting mask (EAPSM) blanks for ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3996, Issue , 2000, Pages 108-113

  Mitsui, Hideaki ^a   Nozawa, Osamu ^a   Ohtsuka, Hitoshi ^a   Takeuchi, Megumi ^a   Kobayashi, Hideo ^a   Ushida, Masao ^a  

^a HOYA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE ENHANCEMENT; IMAGE QUALITY; PHOTOLITHOGRAPHY;

DEEP ULTRAVIOLET LITHOGRAPHY; EMBEDDED ATTENUATED PHASE SHIFTING MASKS (EAPSM);

MASKS;

EID: 0033871916     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)