Peculiarities of imaging one- and two-dimensional structures in an emission electron microscope. 1. Theory

Journal of Microscopy

Volumn 199, Issue 2, 2000, Pages 124-129

  Nepijko, S A ^a,b   Sedov, N N ^c   Ziethen, Ch ^a   Schonhense G ^a   Merkel, M ^d   Escher, M ^d  

^a JOHANNES GUTENBERG UNIVERSITY   (Germany)

^b INSTITUTE OF PHYSICS   (Ukraine)

^c Moscow Military Institute   (Ukraine)

^d Focus GmbH   (Germany)

Author keywords

Contact potential difference; Emission electron microscope (EEM); Resolution

Indexed keywords

ELECTRON EMISSION; ELECTRON MICROSCOPES; ELECTRONS;

ACCELERATING FIELDS; CONTACT POTENTIAL DIFFERENCE; EMISSION ELECTRON MICROSCOPE; EMISSION ELECTRON MICROSCOPES; FIELD DISTRIBUTION; MICROFIELDS; ONE-DIMENSIONAL; RESOLUTION; SAMPLE SURFACE; TWO-DIMENSIONAL STRUCTURES;

ELECTRODES;

ARTICLE; CALCULATION; ELECTRIC FIELD; ELECTRON MICROSCOPY; PRIORITY JOURNAL; SURFACE PROPERTY;

EID: 0033867170     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.2000.00713.x     Document Type: Article

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