X-ray diffraction study of bond character of rutile-type SiO2, GeO2 and SnO2

Zeitschrift fur Kristallographie

Volumn 215, Issue 36708, 2000, Pages 424-428

  Yamanaka, T ^a   Kurashima, R ^a   Mimaki, J ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM DIOXIDE; SILICON DIOXIDE; TIN DERIVATIVE; TIN DIOXIDE; TITANIUM DIOXIDE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL BOND; CHEMICAL STRUCTURE; CRYSTAL STRUCTURE; ELECTRON; RADIATION SCATTERING; STRUCTURE ANALYSIS; X RAY DIFFRACTION;

EID: 0033815630     PISSN: 00442968     EISSN: None     Source Type: Journal    
DOI: 10.1524/zkri.2000.215.7.424     Document Type: Article

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