Ordered growth of substituted phthalocyanine thin films: Hexadecafluorophthalocyaninatozinc on alkali halide (100) and microstructured Si surfaces

Chemistry of Materials

Volumn 12, Issue 4, 2000, Pages 989-995

  Schlettwein, D ^a   Hesse, K ^a   Tada, H ^b,c   Mashiko, S ^b   Storm, U ^a   Binder, J ^a  

^a UNIVERSITY OF BREMEN   (Germany)

^b Ministry of Posts and Telecommunications   (Japan)

^c KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HALIDE; PHTHALOCYANINE DERIVATIVE; SILICON DIOXIDE;

ABSORPTION SPECTROSCOPY; ARTICLE; ELECTRODE; FILM; MOLECULAR INTERACTION; SEMICONDUCTOR; STRUCTURE ANALYSIS; SYNTHESIS; TEMPERATURE DEPENDENCE; ULTRAVIOLET SPECTROSCOPY;

EID: 0033807971     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9905388     Document Type: Article

References (0)