Routine analysis of Ultra Pure Water by ICP-MS in the low- and sub-ng/L level

Fresenius' Journal of Analytical Chemistry

Volumn 366, Issue 1, 2000, Pages 64-69

  Hoelzl, Robert ^a   Fabry, Lazlo ^a   Kotz, Ludwig ^a   Pahlke, Siegfried ^a  

^a SILTRONIC AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

WATER;

ARTICLE; ATOMIC ABSORPTION SPECTROMETRY; CHEMISTRY; COMPARATIVE STUDY; INSTRUMENTATION; MASS SPECTROMETRY; METHODOLOGY; STANDARD; STATISTICAL MODEL;

LINEAR MODELS; MASS SPECTROMETRY; REFERENCE STANDARDS; SPECTROPHOTOMETRY, ATOMIC; WATER;

EID: 0033765984     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/s002160050013     Document Type: Article

References (13)

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2. Fabry L (1996) Accred Qual Assur 1 : 99-108
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4. Fucsko J, Mikulsky J, Balazs MK (1996) Semiconductor Pure Water and Chemicals Conference, March
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13. Malhotra S, Chan O, Chu T, Fucsko A (1996) Ultrapure Water 13/4 : 22-26