Dielectric barrier discharges with steep voltage rise: Laser absorption spectroscopy of NO concentrations and temperatures

Plasma Sources Science and Technology

Volumn 9, Issue 2, 2000, Pages 146-151

  Spaan, M ^a   Leistikow, J ^a   Schulz Von Der Gathen, V ^a   Dobele H F ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ELECTRIC DISCHARGES; ELECTRIC EXCITATION; ELECTRIC POTENTIAL; LASER APPLICATIONS; NITROGEN OXIDES;

DIELECTRIC BARRIER DISCHARGES (DBD); LASER ABSORPTION SPECTROSCOPY;

PLASMA SOURCES;

EID: 0033752182     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/2/306     Document Type: Article

References (16)

1. Kogelschatz U 1988 Process Technologies for Water Treatment ed S Stucki (New York: Plenum) p 87
2. Pietsch G J and Gibalov V I 1998 Pure Appl. Phys. 70 1169
3. Braun D, Küchler U and Pietsch G J 1991 J. Phys. D: Appl. Phys. 24 564
4. Eliasson B and Kogelschatz U 1988 Appl. Phys. B 46 299
5. Stockwald K and Neiger M 1995 Contrib. Plasma Phys. 35 15
6. Eliasson B and Kogelschatz U 1991 IEEE Trans. Plasma Sci. 19 1063
7. Chang M B and Chang C-C 1997 AlChE J. 43 1325
8. Evans D, Rosocha L A, Anderson G K, Coogan J J and Kushner M J 1993 J. Appl. Phys. 74 5378
9. Chang M B, Balbach J H, Rood M J and Kushner M J 1991 J. Appl. Phys. 69 4409
10. Neiger M, Wolf O, Hammer T and Broer S 1996 Appl. Phys. Lett. 68 3719
11. Neiger M, Russ H, Walter M and Wegst R 1999 Proc. 5th Int. Conf. on Advanced Oxidation Technologies for Water and Air Remediation (24-28 May, Albuquerque, USA, 1999) pp 9-10
12. Vinogradov I P and Wiesemann K 1997 Plasma Sources Sci. Technol. 6 307
13. Coogan J J and Sappey A D 1996 IEEE Trans. Plasma Sci. 24 91
14. Falkenstein Z and Coogan J J 1997 J. Phys. D: Appl. Phys. 30 817
15. Behringer K 1991 Plasma Phys. Control. Fusion 33 997
16. To be published