Highly anisotropically self-assembled structures of para-sexiphenyl grown by hot-wall epitaxy

Advanced Materials

Volumn 12, Issue 9, 2000, Pages 629-633

  Andreev, Andrei ^a,b   Matt, Gebhart ^a   Brabec, Christoph J ^a   Sitter, Helmut ^a   Badt, Dirk ^a   Seyringer, Heinz ^a   Sariciftci, N S ^a  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b INSTITUTE FOR PHYSICS OF MICROSTRUCTURES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICA; PHOTOLUMINESCENCE; PLASTIC FILMS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

HOT WALL EPITAXY (HWE);

OLIGOMERS;

EID: 0033751650     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4095(200005)12:9<629::AID-ADMA629>3.0.CO;2-S     Document Type: Article

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