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Volumn , Issue , 2000, Pages 83-92
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Role of the spacer oxide in determining worst-case hot-carrier stress conditions for NMOS LDD devices
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC CHARGE;
ELECTRIC RESISTANCE;
HOT CARRIERS;
SEMICONDUCTOR DEVICE MODELS;
STRESS ANALYSIS;
THERMAL EFFECTS;
LIGHTLY-DOPED-DRAIN (LDD) NMOS DEVICES;
MOS DEVICES;
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EID: 0033748596
PISSN: 00999512
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
Times cited : (7)
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References (8)
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