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Volumn 9, Issue 3, 2000, Pages 843-846

Mechanism of destruction of a-C:H films under the action of aggressive liquids

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; BINDING ENERGY; CARBON DIOXIDE; INTERFACES (MATERIALS); MASS SPECTROMETRY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SINGLE CRYSTALS;

EID: 0033746985     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00290-3     Document Type: Article
Times cited : (4)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.