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Volumn 27, Issue 10, 2000, Pages 2242-2255
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A design for a dual assembly multileaf collimator
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Author keywords
Megavoltage imaging; Multileaf collimator (MLC); Penumbra; Radiation profiles
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Indexed keywords
LEAD ALLOYS;
TUNGSTEN ALLOYS;
DOUBLE EXPOSURE;
DUAL ASSEMBLIES;
FIELD PROFILE;
LATERAL MOVEMENT;
MEGAVOLTAGE IMAGING;
MULTILEAF COLLIMATORS;
MULTIPLE SLITS;
PENUMBRA;
BIOMEDICAL ENGINEERING;
ARTICLE;
BEAM THERAPY;
COLLIMATOR;
IMAGE DISPLAY;
PRIORITY JOURNAL;
RADIATION DOSE DISTRIBUTION;
RADIATION SHIELD;
THICKNESS;
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EID: 0033743933
PISSN: 00942405
EISSN: None
Source Type: Journal
DOI: 10.1118/1.1290731 Document Type: Article |
Times cited : (2)
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References (19)
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