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Volumn 40, Issue 4-5, 2000, Pages 609-612

Accurate determination of composition and bonding probabilities in plasma enhanced chemical vapour deposition amorphous silicon oxide

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL BONDS; CRYSTAL MICROSTRUCTURE; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; INFRARED RADIATION; LIGHT ABSORPTION; LIGHT REFLECTION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING FILMS; STOICHIOMETRY;

EID: 0033743147     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0026-2714(99)00279-6     Document Type: Article
Times cited : (2)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.