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Volumn 40, Issue 4-5, 2000, Pages 609-612
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Accurate determination of composition and bonding probabilities in plasma enhanced chemical vapour deposition amorphous silicon oxide
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CHEMICAL BONDS;
CRYSTAL MICROSTRUCTURE;
FILM PREPARATION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HYDROGEN;
INFRARED RADIATION;
LIGHT ABSORPTION;
LIGHT REFLECTION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING FILMS;
STOICHIOMETRY;
GAS FLOW RATIO;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 0033743147
PISSN: 00262714
EISSN: None
Source Type: Journal
DOI: 10.1016/s0026-2714(99)00279-6 Document Type: Article |
Times cited : (2)
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References (9)
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