Combined thermodynamic and mass transport modeling for material processing from the vapor phase

Thin Solid Films

Volumn 365, Issue 2, 2000, Pages 264-274

  Pons, Michel ^a   Bernard, Claude ^a   Blanquet, Elisabeth ^a   Madar, Roland ^b  

^a UNIV GRENOBLE ALPES   (France)

^b LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL METHODS; MICROELECTRONIC PROCESSING; SEMICONDUCTING SILICON COMPOUNDS; THERMODYNAMICS; THIN FILMS; VAPOR PHASE EPITAXY;

SILICON GERMANIDE; THERMOCHEMICAL EQUILIBRIUM; TITANIUM SILICIDE;

SEMICONDUCTING FILMS;

EID: 0033742006     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)01052-4     Document Type: Article

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